4:00 pm,
Wednesday,
March 7, 2007
Science 106
Atomic Layer Deposition: The Technology and its Application in Energy Research
The Goshen College Science Speaker Series presents:
- Victor Oyeyemi
Mathematics and Physics
Goshen College
Mr. Oyeyemi speaks about his current research at Argonne National Laboratory. Atomic Layer Deposition (ALD) is a technology that is used for the controlled coating of materials. Using this technique, thin films can be coated on a variety of surfaces from planar to powders one molecular layer at a time. The technology has applications in the engineering of materials for catalysis, fuel cell research, and molecular filters and so on. His current research area is in the ALD of Cobalt Oxide, a catalyst used in the synthesis of fuel (syngas) from hydrogen and carbon monoxide.
Contact: David Housman, phone 7405, email dhousman@goshen.edu
See also: Science Speakers website