4:00 pm, Wednesday, March 7, 2007
Science 106

Atomic Layer Deposition: The Technology and its Application in Energy Research

The Goshen College Science Speaker Series presents:

    Victor Oyeyemi

    Mathematics and Physics
    Goshen College

Mr. Oyeyemi speaks about his current research at Argonne National Laboratory. Atomic Layer Deposition (ALD) is a technology that is used for the controlled coating of materials. Using this technique, thin films can be coated on a variety of surfaces from planar to powders one molecular layer at a time. The technology has applications in the engineering of materials for catalysis, fuel cell research, and molecular filters and so on. His current research area is in the ALD of Cobalt Oxide, a catalyst used in the synthesis of fuel (syngas) from hydrogen and carbon monoxide.

Contact: David Housman, phone 7405, email dhousman@goshen.edu

See also: Science Speakers website